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SiC Cantilever Paddles
Semixlab’s SiC Cantilever Paddles are precision-engineered components designed for wafer handling in high-temperature semiconductor processes such as epitaxy, oxidation, and CVD. Made from high-purity recrystallized or CVD silicon carbide, these paddles offer excellent thermal conductivity, low thermal expansion, and exceptional chemical resistance. Their lightweight, high-strength design ensures dimensional stability and wafer protection during rapid thermal cycling. Trusted by global semiconductor leaders, Semixlab provides fully customized solutions, fast delivery, and long product lifespan—making it an ideal partner for advanced semiconductor manufacturing needs.
Description
Ⅰ. High-Purity SiC Cantilever Paddles for Precision Wafer Handling
SiC Cantilever Paddles are critical components used in thermal processing equipment for handling wafers during epitaxy, diffusion, and oxidation steps in semiconductor fabrication. Their exceptional thermal and mechanical properties make them ideal for high-temperature and corrosive environments in cleanroom operations.
Ⅱ. Product Overview & Functional Advantages
1. Exceptional Material Properties for High-Performance Applications
Semixlab’s SiC Cantilever Paddles are manufactured from high-purity, recrystallized silicon carbide (R-SiC) or CVD SiC coatings, providing excellent thermal conductivity (up to 120 W/m·K), low thermal expansion (~4.0 x 10⁻⁶/K), and outstanding resistance to corrosion and thermal shock. These properties ensure stable wafer support during high-temperature processes, minimizing wafer deformation or contamination risks.
2. Superior Dimensional Stability and Flatness
With minimal warpage even at temperatures exceeding 1400°C, the cantilever design ensures uniform wafer placement and transfer, which is vital for epitaxial layer uniformity. The low mass and high stiffness of SiC improve system throughput and temperature response during rapid thermal processing.
3. Cleanroom-Grade Surface Purity
Thanks to the dense and smooth SiC surface finish, Semixlab paddles minimize particle generation and outgassing. This is particularly important in environments requiring Class 1 or ISO 14644-1 Class 2 cleanliness levels.
4. Tailored for Epitaxial, Diffusion, and CVD Furnaces
Our SiC Cantilever Paddles are widely used in MOCVD, LPCVD, and oxidation furnace platforms, compatible with leading equipment brands such as ASM, TEL, and Veeco. They are engineered for optimal thermal uniformity and mechanical precision, helping ensure higher yield and lower process variation.
Ⅲ. Why Choose Semixlab?
We provide tailor-made engineering services, including:
● Product customization for size, structure, and material grade
● Coating optimization for thermal and chemical resistance
● Fast prototyping and small-lot production capabilities
● Technical consulting and design validation
As a leading Chinese manufacturer and factory of SiC Cantilever Paddles products, Semixlab insists on providing customized technology and product solutions. Whether you want to optimize the existing heat treatment process, purchase high-performance replacement parts, or jointly develop customized SiC solutions, Semixlab will provide you with technical and delivery support.
Applications
● MOCVD epitaxy wafer carriers
● Oxidation and diffusion furnace paddle arms
● Wafer loading systems in LPCVD/CVD tools
● Customized susceptor support arms for compound semiconductor growth
Our Services
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