High Purity SiC Boat
| Place of Origin: | China |
| Brand Name: | Semixlab |
| Model Number: | High Purity SiC Boat-01 |
| Certification: | ISO9001 |
| Minimum Order Quantity: | Subject to negotiation |
| Price: | Contact for Customized Quotation |
| Packaging Details: | Standard export package |
| Delivery Time: | 45-60 Days After Order Confirmation |
| Payment Terms: | T/T |
| Supply Ability: | 50units/Month |
Description
High-purity silicon carbide (SiC) boat is a high-performance ceramic carrier designed for high-temperature semiconductor processes, crystal growth and precision heat treatment. It is sintered with ultra-high purity SiC material and has excellent high temperature resistance, thermal shock resistance and chemical stability. It is widely used in semiconductor diffusion, CVD, LED epitaxy and photovoltaic single crystal growth.
Application:
High Purity SiC Boat is a key semiconductor process consumable, mainly used to carry and transfer wafers in high-temperature environments, and is widely used in silicon wafer diffusion, oxidation, annealing and CVD processes. It is especially suitable for high-temperature processes of third-generation semiconductors (such as SiC/GaN) and power devices.
Services that can be provided:
customer application scenario analysis, matching materials, technical problem solving.
Company profile:
Semixlab has 2 laboratories, a team of experts with 20 years of material experience, with R&D and production, testing and verification capabilities.
Specifications
Technical Parameters
| project | parameter |
| Material Type | Sintered Silicon Carbide (SSiC/RSiC) |
| Density | 3.0-3.2 g/cm3 |
| Thermal Conductivity | 120-150 W/m·K |
| Maximum Operating Temperature | 1600°C (Oxidizing Atmosphere) |
| Surface Roughness | Ra ≤0.5μm (Polishable) |

Applications
Main application fields
| Application direction | Typical scenario |
| Semiconductor industry | Carriers in wafer diffusion, annealing, and oxidation processes. |
| Support tools for epitaxial growth (such as SiC epitaxy). | |
| LED/MOCVD | As trays in the growth process of GaN and LED chips. |
| Photovoltaic industry | Used for high-temperature sintering of solar cells. |
| Research field | Containers for high-temperature experiments (such as material synthesis and heat treatment). |
Ecological chain verification endorsement
Semixlab High-Purity SiC Boat's ecological chain verification covers raw materials to production, has passed international standard certification, and has a number of patented technologies to ensure its reliability and sustainability in the semiconductor and new energy fields.
Typical application process
Raw Material Preparation (High-Purity SiC Powder) → Forming Process (Dry Pressing/Isostatic Pressing) → Sintering Process → Machining & Surface Finishing(CNC Grinding/Polishing, Chemical Etching, Annealing) → Purification & CVD Coating → Quality Control → Packaging
Through cutting-edge process parameter optimization, Semixlab High-Purity SiC Boat's unique structural design ensures excellent wafer stability while significantly reducing the risk of particle contamination. Its service life can reach 5-8 times that of traditional quartz boats, making it an ideal carrier solution for high-temperature wafer processing. This innovation enables it to gradually replace imports in the semiconductor market, providing a high-performance, cost-effective domestic solution.
For detailed technical specifications, white papers, or sample testing arrangements, please contact our Technical Support Team to explore how Semixlab can enhance your process efficiency.
Competitive Advantage
Semixlab High-Purity SiC Boat core advantages
1. Extreme purity (key advantage)
Semixlab High-Purity SiC Boat has ultra-high purity (≥99.9999%), and the impurity content (Fe, Al, Na, etc.) is controlled at the 1 ppm level to avoid contamination of wafers or epitaxial materials, which is especially suitable for SiC/GaN semiconductor manufacturing.
2. Chemical inertness (corrosion resistance)
Resistant to acid, alkali/plasma erosion, and can resist corrosive gases such as HF, HCl, H2(such as semiconductor etching processes). No gas release at high temperatures.
3. Mechanical strength and lifespan
Ultra-high hardness, excellent wear resistance, reduces the risk of particle shedding, and extends service life (usually 3 to 5 times that of a quartz boat). Not easily deformed at high temperatures, maintaining wafer flatness (such as warpage in a diffusion furnace <0.1mm).
4. Process compatibility
Adaptable to a variety of harsh environments, oxidation/reduction atmospheres (such as O2, H2, Ar) and CVD/PVD coating processes. The surface can be customized, such as polishing (Ra<0.1μm) or coating (such as SiO2) to further reduce contamination.
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