Semiconductor quartz wafer

The Semixlab Semiconductor Quartz Wafer is a precision-polished, ultra-high-purity fused silica substrate designed for demanding semiconductor processing environments.

It is widely applied as a dummy wafer, carrier wafer, optical substrate, and photomask base in thermal oxidation, CVD/LPCVD, PECVD, and lithography systems.

Engineered from 99.99% high-purity SiO₂, this quartz wafer offers exceptional thermal stability, chemical inertness, and optical transparency, ensuring stable and contamination-free operation in advanced semiconductor manufacturing lines.

Ⅰ. Material and Surface Properties

● Material: Synthetic or natural fused silica (SiO₂ ≥ 99.99%).

● Diameter Options: 2", 4", 6", 8", 12" (custom sizes available).

● Surface Finish: Double-side polished, flatness ≤ 5 μm, surface roughness ≤ 0.5 nm.

● Thermal Resistance: Stable up to 1200°C continuous operation.

● Thermal Expansion Coefficient: 5.5 × 10⁻⁷ /°C.

● Optical Transmission: >90% from 190 nm to 2,600 nm.

Each wafer undergoes strict surface inspection, dimensional verification, and purity analysis to ensure full compliance with semiconductor-grade requirements.

Ⅱ. Key Functions in Semiconductor Processes

1. Process Carrier in CVD and LPCVD Systems

Quartz wafers are used as dummy or spacer wafe to stabilize gas flow and temperature uniformity during SiO₂, Si₃N₄, and polysilicon thin-film deposition. Their dimensional precision ensures uniform film growth and minimal particle generation throughout deposition cycles.

2. Oxidation and Diffusion Furnace Applications

In high-temperature oxidation and dopant diffusion processes, quartz wafers act as thermal shields or process monitors, maintaining uniform temperature distribution and preventing contamination of production wafers.

3. Optical and Lithography Use

Thanks to its high optical transmittance and refractive index uniformity, the quartz wafer is ideal for photomask fabrication, DUV exposure substrates, and optical calibration tools. It guarantees consistent light transmission for i-line, KrF, and ArF lithography systems.

4. Plasma and Etching Environments

In dry etching and plasma CVD systems, quartz wafers are used as chamber shields or plasma windows, offering excellent dielectric strength and chemical durability against halogen-based gases (CF₄, SF₆, Cl₂).

5. Metrology and Equipment Calibration

Quartz wafers serve as reference wafers for film thickness, temperature, and flatness calibration. Their ultra-smooth, defect-free surface enables accurate and repeatable measurement results, ensuring process control stability.

Typical Applications

● Dummy wafer for CVD, LPCVD, and PECVD systems

● Process carrier or thermal shield in oxidation and diffusion furnaces

● Photomask substrate for UV/DUV lithography

● Reference wafer for equipment calibration and metrology

● Plasma chamber window and etching process protector

The Semixlab Semiconductor Quartz Wafer is a high-performance substrate engineered for the most demanding semiconductor processes. Its thermal stability, optical precision, and chemical purity make it indispensable in deposition, oxidation, lithography, and metrology applications. With comprehensive customization and engineering support, Semixlab delivers solutions that maximize process consistency, yield reliability, and operational efficiency. We sincerely hope to become your long-term partner in China.