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Opaque Fused Quartz Half-Moon Components for MOCVD Systems
Semixlab Opaque Fused Quartz Half-Moon Components (Upper and Lower Carriers/Rings) are built to address the critical high-temperature challenges found inside MOCVD and LPE reaction chambers. These half-moon parts are produced using our proprietary electric fusion process, which gives them an engineered micro-bubble internal structure that scatters infrared (IR) light effectively and provides thermal shielding.
Description
Product Overview
In compound semiconductor epitaxy (GaN/SiC), wafer yield depends heavily on thermal field uniformity and precise radiation management. Acting as precision carriers and gas-flow directing assemblies, Semixlab Opaque Fused Quartz Half-Moon Components protect sensitive chamber components, stabilise temperature gradients, and reduce particle contamination in extreme operating environments up to 1200°C.
Key Features & Technical Advantages
● Enhanced Thermal Shielding via Mie Scattering: Standard clear quartz lets IR radiation pass straight through, which creates severe thermal gradients across the reaction zone. Semixlab's opaque quartz contains a high-density matrix of microscopic bubbles. These microbubbles work as internal reflectors, scattering thermal radiation to even out heat distribution and lower localised thermal stress by 20% to 30% – this also significantly reduces the risk of component cracking.
● Ultra-Low Hydroxyl (<5 ppm OH) for Superior Structural Rigidity: Above 1100°C, thermal softening and mechanical creep can cause critical chamber jams and vacuum loss. By keeping hydroxyl content below 5 ppm, our half-moon components maintain excellent high-temperature viscosity and dimensional stability, ensuring smooth rotation and stable gas introduction through the connected quartz tubes.
● Sub-Surface Pore Sealing (Fire-Polished Sealing): Unsealed opaque quartz tends to absorb metal contaminants (Na, K, Fe, Cu) and process acids like a sponge. Every Semixlab quartz component receives a specialised high-temperature flame polishing treatment. This creates a dense, non-porous glass-phase outer layer that prevents chemical absorption during cleaning, avoids secondary wafer contamination, and extends the component's service life.
● Extreme Chemical Purity (<15 ppm Total Metals): Made from ultra-pure natural quartz sand and processed under strict ISO 9001 quality management, our material maintains total metallic impurities below 15 ppm, confirmed by GDMS testing to protect your epitaxial layers from yield-reducing ionic diffusion.
Why Choose Semixlab Technology?
● CAS Academic R&D Heritage: Founded by former Chinese Academy of Sciences (CAS) professors, combining deep fundamental material physics with high-volume industrialization.
● Full-Element GDMS Traceability: Every production batch includes complete GDMS mass analysis reporting for total quality transparency.
● Direct Precision Machining: In-house CNC capabilities ensure exact alignment, smooth gas flow dynamics, and micron-level fit.
Ready to optimize your MOCVD thermal field?
Contact our engineering sales team for custom engineering blueprints and GDMS test kits.
Specifications
| Material Property | Semixlab Official Standard | Industry Reference Standard | Process Advantage |
| Purity (Total Metals) | < 15 ppm | < 20 ppm | Prevents Fe/Cu/Li ion diffusion into epi-layers |
| Hydroxyl (OH) Content | < 5 ppm | < 10 ppm | Prevents structural creep and deformation >1100°C |
| Thermal Expansion Coeff. (CTE) | 0.45 × 10⁻⁶ /°C | 0.40 – 0.50 × 10⁻⁶ /°C | Outstanding thermal shock resistance |
| Thermal Conductivity (20°C) | 1.39 W/m·K | 1.30 – 1.50 W/m·K | Excellent thermal insulation for thermal field control |
| Max Working Temperature | 1200°C (Continuous) | 1100°C | Extended lifespan in continuous production cycles |
Applications
Applications & Reactor Compatibility
Semixlab half-moon quartz components are precision-machined for the following uses:
● MOCVD Epitaxy: Upper carriers for chamber accessory management and temperature control.
● LPE & Gas-Driven Rotation Systems: Lower half-moon components connected to quartz driving tubes to guide rotational gas flows.
● Third-Generation Semiconductor Fabrication: Critical thermal shielding in GaN-on-Si, GaN-on-Sapphire, and SiC epitaxy systems.
● Drop-In OEM Compatibility: Precision machined to tight tolerances (±0.1 mm) for seamless integration into leading global platforms including Aixtron, Veeco, AMEC, and LPE horizontal reactors.
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