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High purity quartz diffusion Tube
Semixlab is a leading quartz component manufacturer in China, specializing in the design and production of high purity quartz diffusion tubes for semiconductor oxidation, diffusion, and annealing processes. Crafted from ultra-pure fused silica (≥99.99% SiO₂) and refined through precision forming and strict contamination control, each tube ensures outstanding thermal stability and ultra-low metal impurity levels. Looking forward to your further consultation.
Description
Semixlab High Purity Quartz Diffusion Tube is specifically engineered for high-temperature thermal processes in semiconductor manufacturing, including oxidation, dopant diffusion, and annealing.
Manufactured from ultra-high purity fused silica (≥99.99% SiO₂), each tube is designed to deliver exceptional chemical stability, minimal contamination, and precise thermal uniformity—ensuring consistent wafer processing results in demanding cleanroom environments.
Whether integrated into vertical or horizontal diffusion furnaces, Semixlab’s quartz tubes are precision-formed and thoroughly tested to meet the stringent requirements of IC, LED, MEMS, and power device fabrication.
Applications
Applications in Semiconductor Processes
1. Thermal Oxidation
In thermal oxidation furnaces, quartz diffusion tubes act as the primary reaction chamber where silicon wafers are exposed to O₂ or H₂O vapor at elevated temperatures (900–1150°C).
● Provides a clean and stable oxygen environment for uniform SiO₂ growth.
● Eliminates metal ion contamination, ensuring high dielectric integrity for gate and isolation oxides.
High purity quartz Diffusion Tube is ideal for wafer processing
2. Dopant Diffusion
Quartz diffusion tubes are used to diffuse dopant atoms (such as phosphorus or boron) into the silicon substrate to create desired junction profiles.
● Excellent chemical inertness prevents contamination during POCl₃ or BBr₃ reactions.
● Maintains high purity even in halogen-based atmospheres.
3. Annealing and Drive-In Processes
After ion implantation or deposition, wafers undergo high-temperature annealing to activate dopants and repair lattice damage.
● Quartz tubes provide a thermally uniform, low-contamination chamber for stable and reproducible results.
● Suitable for both N₂ and forming gas annealing environments.
4. LPCVD and R&D Thermal Processing
In small-scale LPCVD or research furnaces, quartz diffusion tubes can serve as both the reaction and containment chamber.
● Ideal for deposition of polysilicon, silicon nitride, and oxide films.
● Ensures low particle formation and high repeatability across runs.
Competitive Advantage
Semixlab Advantages
1. Material Purity & Traceability
Every quartz tube is made from ultra-pure fused silica sourced from certified suppliers. ICP-MS analysis reports are available upon request, guaranteeing traceability of each batch.
2. Precision Manufacturing & Customization
Semixlab offers customized designs to meet the specific furnace dimensions, thermal profiles, and gas flow patterns required by customers.
Options include:
● Vertical or horizontal tube configurations
● Customized diameters, wall thicknesses, and end flanges
● Polished or etched surface finishes
● Special handling designs for multi-wafer carriers
3. Rigorous Testing & Quality Assurance
Each diffusion tube undergoes dimensional inspection, surface integrity testing, and thermal stress simulation before shipment. This ensures compatibility with industry-leading diffusion furnace systems such as TEL, Kokusai, Centrotherm, and ASM.
