Quartz Insulator Pedestal 300mm

The AMAT Quartz Insulator Pedestal 300mm (Part No. 0200-14197) is a precision-engineered, high-purity quartz component designed for use in 300mm semiconductor process equipment, including PVD, CVD, and plasma etching systems.

As a critical structural and functional element within the chamber, this component integrates mechanical support, electrical insulation, and process isolation into a single high-performance solution. It is specifically developed to meet the stringent requirements of advanced wafer fabrication, where process stability, contamination control, and equipment reliability are essential.

At Semixlab, we manufacture quartz pedestal components using ultra-high purity fused quartz and advanced machining technologies to ensure excellent dimensional accuracy, dielectric performance, and long-term durability under harsh plasma environments.

Why Choose Semicera Semiconductor?

Semixlab combines materials expertise, semiconductor process knowledge, and precision manufacturing to deliver reliable quartz components for advanced fabs.

Our Advantages:

● Ultra-high purity quartz material control

● Tight tolerance machining for critical dimensions

● Proven performance in plasma-intensive applications

● OEM-compatible solutions for AMAT platforms

● Stable global supply and engineering support

Process Application & Chamber Position

The Quartz Insulator Pedestal is primarily used in front-end semiconductor manufacturing processes, particularly in environments involving RF plasma, high ताप conditions, and vacuum processing.

Chamber Position

This component is installed in the lower section of the process chamber, typically beneath or around the wafer support assembly (e.g., electrostatic chuck or heater stage).

It operates in close proximity to:

● The wafer handling region

● The electrostatic chuck (ESC) or pedestal structure

● RF-powered plasma zones

Role in Equipment Architecture

Within the chamber system, the Quartz Insulator Pedestal serves as a critical interface between electrically active components and grounded mechanical structures.

Its position enables it to:

● Electrically isolate high-voltage or RF-powered elements

● Support the mechanical integrity of the wafer stage

● Maintain a stable and controlled process environment

Core Functions & Performance Advantages

1) Electrical Insulation in RF Plasma Environments

One of the most critical functions of this component is to provide high dielectric strength insulation in systems operating under RF bias and plasma conditions.

● Prevents electrical leakage and unintended current paths

● Reduces the risk of arcing and plasma instability

● Ensures consistent RF field distribution

Result: Improved process repeatability and equipment safety

2) Mechanical Support & Structural Stability

As part of the pedestal assembly, the component provides:

● Stable support for wafer handling systems

● High dimensional precision to maintain alignment

● Resistance to deformation under thermal cycling

Result: Enhanced wafer positioning accuracy and film uniformity

3) Plasma Compatibility & Contamination Control

Manufactured from ultra-high purity quartz, this component offers:

● Low metallic impurity levels

● Excellent resistance to plasma erosion

● Minimal particle generation

Result: Reduced contamination risk and improved wafer yield

4) Thermal Isolation Performance

Quartz inherently exhibits low thermal conductivity, allowing the pedestal to:

● Isolate heat transfer between heater/ESC and chamber structures

● Maintain stable wafer ताप profiles

● Minimize thermal stress within the system

Result: Better process control and extended component lifetime