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Hot Zone Graphite Heater
Hot Zone Graphite Heater

Hot Zone Graphite Heater


Designed for high-demand vacuum and inert atmospheres, this spiral graphite heater is a core cornerstone for semiconductor crystal growth and advanced thermal processing, capable of withstanding up to 1600°C while increasing in strength at high temperatures. Its precision-engineered spiral structure ensures exceptional thermal uniformity within ±1.5%, while a high purity level (Total Impurities < 5ppm) prevents any metallic contamination. Despite the material's inherent fragility, our upgraded multi-layer shock-absorption packaging guarantees that these high-performance heaters arrive at your facility in perfect, ready-to-use condition. We look forward to receiving your inquiry.

Description

The High-Purity Spiral Graphite Heater (Mosquito Coil-Type) is a precision core component specifically engineered for demanding applications in semiconductors, crystal growth, and advanced material high-temperature heat treatment. Leveraging the Joule Heating principle, this component utilizes high-purity, high-density Isostatic Graphite as the resistively heated element. When a large low-voltage current is passed through the isostatic graphite substrate with its specific electrical resistance characteristics, electrical energy is converted with exceptional efficiency and uniformity into thermal energy according to Joule's law (Q = I2Rt). The generated heat is then evenly distributed across the workspace via high-temperature radiation and convection.

Principle of electrical resistance resistance heating

The key to its outstanding performance within vacuum or inert atmosphere environments lies in its unique spiral 'mosquito coil-type' structure design. Compared to traditional cylindrical heating elements, this spiral geometry significantly increases the radiative surface area, thereby enabling both superior temperature field uniformity—typically controlled within ±1.5%—and a much faster rapid heating response. Furthermore, our carefully selected premium fine-grain isostatic graphite substrate features a bulk density of ≥1.85g/cm³, resistivity of 11~15μΩ·m, and Total Impurities≤5ppm. This not only ensures high electro-thermal conversion efficiency but also endows the product with exceptional thermal conductivity, bending strength, and thermal shock resistance, ensuring it remains structurally stable, crack-resistant, and free from softening deformation even under extreme high-temperature.

Atomic Structure of High-Purity Graphite

Graphite heaters serve as the irreplaceable "heart" for semiconductor crystal growth and advanced material heat treatment. Utilizing high-purity isostatic graphite and precision spiral engineering, we provide exceptionally stable thermal field solutions for global clients.

Material & Design Excellence

Isostatic Graphite: Offers superior bending strength and thermal shock resistance; remains structurally stable without softening or cracking under rapid thermal cycles.

Precision Spiral Design: The "mosquito coil" geometry significantly increases the radiative surface area compared to traditional designs, enabling faster ramp rates and higher efficiency.

Advanced Manufacturing: Our 5-axis machining centers ensure high-precision milling of complex grooves, supported by rigorous CMM dimension and resistivity testing.

Our Advanced Packaging

To solve the industry-wide challenge of fragility in spiral graphite components, we have implemented a Proprietary Vacuum Shock-Absorption System:

● Full-Contour Lining: Customized flame-retardant foam and flexible graphite paper provide 100% surface protection.

● Vacuum-Lock Technology: Vacuum-sealed inner packaging tightly secures the product, completely eliminating shifting or collision during transit.

● Reinforced Outer Crates: High-strength, fumigation-free wooden cases or thickened KT boards with anti-tilt indicators.

Isotropic Graphite Heater

Specifications
Key FeatureTechnical SpecsOperational Value
Max Operating Temp1600°C (Vacuum/Inert)Ideal for SiC sintering and graphitization
Temp Uniformity< ±1.5%Ensures consistent quality in crystal growth
Surface PurityTotal Impurities < 5ppmPrevents metallic contamination in cleanrooms
Material Density≥ 1.85g/cm³High-strength substrate for extended service life
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