High-Purity PECVD Graphite Boats
Semixlab Technology Co., Ltd. develops graphite and carbon-based components used in photovoltaic and semiconductor production equipment. The company mainly focuses on purification processing, graphite machining, and customized carrier structures for automated manufacturing lines. Over the years, Semixlab has supplied various graphite consumables and thermal field parts for customers involved in TOPCon, HJT, and conventional solar cell production processes. Looking forward to your further inquiry.
Description
Product Overview
PECVD graphite boats are widely used in solar cell manufacturing lines where silicon wafers need to pass through plasma coating and passivation processes repeatedly. Since the graphite carrier directly contacts wafers during loading, transfer, and deposition, its stability has a strong influence on contamination control and automation reliability.
Semixlab graphite boats are processed from purified graphite materials with low ash content and stable density distribution. The structure is designed around the practical operating conditions found in continuous production lines, especially where rapid temperature changes and high-frequency robotic handling are common.
In actual use, many factories pay attention not only to purity, but also to deformation after long production cycles. A carrier that bends or changes shape too quickly can easily lead to transfer issues, wafer scratching, or unstable loading positions. To reduce these risks, the graphite boats are designed with relatively low thermal expansion characteristics and improved mechanical consistency.
Different wafer sizes and automation configurations can also be supported according to customer equipment requirements. The product is commonly used for TOPCon, HJT, PERC, and related PECVD production environments.

Key Features
Purified graphite material with ash content below 20ppm.
Stable structure under repeated heating and cooling cycles.
Lower thermal expansion compared with conventional graphite carriers.
Suitable for automated wafer loading systems.
Reduced deformation during long-term plasma process operation.
Compatible with M10 and M12 wafer production platforms.
Machined slot structure helps improve transfer stability.
Available for customized dimensions and pitch spacing.
Production & Material Notes
The graphite materials used for these carrier systems can be selected according to the customer’s process condition and expected service cycle. Depending on the application environment, imported graphite grades or domestic purified materials may both be considered.
Semixlab also supports machining adjustment based on different automation platforms, including slot spacing, guide structure, loading orientation, and assembly configuration. Before mass production, dimensional verification and processing evaluation are normally carried out according to the customer drawings or sample requirements.

Specifications
Technical Specifications
| Parameter | M10 | M12 | Details |
| Wafer Size | 182mm | 210mm | Other sizes available |
| Pitch | 4.76mm | 6.35mm | Custom pitch optional |
| Capacity | 100 pcs | 100 pcs | Depends on line design |
| Purity | <20ppm | <20ppm | Purified graphite |
| Application | TOPCon | TOPCon/HJT | PERC compatible |
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