8-inch TaC Coated Air Float Tray for SiC Epitaxy

The 8-inch TaC Coated Air Float Tray is a critical component in multi-wafer SiC epitaxy processes, designed to support and transport silicon carbide wafers during epitaxial growth. In the demanding environment of SiC epitaxy furnaces, trays must withstand extreme high temperatures, corrosive gases, and long processing cycles. By combining CVD TaC coating with high-purity graphite substrates, this air float tray ensures superior durability, thermal stability, and process uniformity—making it an essential fixture in high-volume SiC wafer manufacturing.

Ⅰ. Material Composition and Physical Properties

The TaC Coated Air Float Tray integrates advanced materials to achieve both mechanical robustness and chemical resistance required in semiconductor epitaxy:

●Substrate Material: High-purity graphite susceptor (ultra-low impurity content, high thermal conductivity)

●Surface Protection Layer: CVD TaC Coating (Tantalum Carbide) applied via chemical vapor deposition for extreme wear and corrosion resistance

Key Physical Properties:

TaC Coating Purity: ≥ 99.99%

Hardness (HK): ~2000 HK

Melting Point: ~3,880 °C

Thermal Conductivity: Excellent, ensuring uniform wafer heating

Resistance to Halogen Corrosion: Outstanding stability in chlorine- and fluorine-rich epitaxial environments

Base Graphite Density: ~1.85–1.95 g/cm³

Working Temperature: Up to 2,000 °C in controlled environments

These properties ensure the 8-inch TaC Coated Tray can withstand long epitaxial runs while minimizing particle generation and wafer contamination.

Ⅱ. Key Functions in SiC Epitaxy

Our 8-inch TaC Coated Tray plays a vital role in the semiconductor SiC epitaxy process by performing several critical functions:

●Uniform Temperature Distribution: The high thermal conductivity of the graphite substrate and TaC coating ensures excellent heat transfer and uniform temperature across all SiC wafers. This uniformity is crucial for achieving consistent epitaxial layer thickness and morphology.

●Protection Against Etching and Contamination: The chemically inert TaC coating effectively prevents the graphite substrate from reacting with precursor gases, which can cause etching and generate particulate contamination. This protection is key to maintaining a clean process environment and ensuring high wafer yield.

●Extended Lifespan: The durable TaC coating significantly extends the lifespan of the susceptor by protecting the graphite from wear and chemical degradation, reducing the frequency of replacement and lowering operational costs.

●Air Float Design: The unique air float design minimizes physical contact between the susceptor and the chamber, reducing friction and preventing potential particle generation that could contaminate the wafers. This design is why it's also known as a TaC Coated Air Float Tray.

Semixlab Advantages

At Semixlab, we go beyond standard products to provide tailored solutions that meet the specific needs of your epitaxy process.

●Customization: We offer comprehensive customization options, including different shapes, sizes, and coating thicknesses, to perfectly match your reactor specifications and process requirements.

●Expert Technical Consultation: Our team of experienced engineers provides in-depth technical support and consultation, helping you optimize your process and integrate our products seamlessly.

●Rigorous Pre-shipment Testing: Every TaC Coated plate undergoes extreme condition testing before it ships. We verify its performance and integrity under high temperatures and in chemically aggressive environments to ensure it will meet your demanding operational needs.