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ALD Planetary Susceptor
ALD Planetary Susceptor

ALD Planetary Susceptor


The ALD Planetary Susceptor is a precision wafer support and motion platform engineered for atomic layer deposition (ALD) thin film processes in advanced semiconductor manufacturing. By enabling synchronized planetary and wafer rotation, it ensures uniform precursor exposure, stable thermal conditions, and consistent surface reactions across multiple wafers. This design supports superior film thickness uniformity, excellent batch-to-batch repeatability, and reliable scalability for high-volume ALD production. We welcome your inquiry.

Description

The ALD Planetary Susceptor is a precision-engineered wafer support and motion platform specifically designed for atomic layer deposition (ALD) thin-film processes used in advanced semiconductor manufacturing. In ALD processes, film growth is governed by atomically-scale, self-limiting surface reactions. Consequently, achieving consistent deposition across multiple wafers demands absolute control over exposure uniformity, temperature stability, and process repeatability. As a core component, the Planetary wafer carrier establishes the foundation for achieving these conditions by synchronizing wafer motion, thermal management, and process stability within the ALD reaction chamber.

Within the ALD system, the Planetary wafer Holder supports multiple wafers and drives them through a controlled combination of planetary rotation and self-rotation. This dynamic motion averages out inherent chamber inefficiencies such as precursor flow distribution, reactant residence time, and temperature gradients. By ensuring each wafer experiences identical deposition conditions throughout the ALD cycle, the planetary susceptor enhances film thickness uniformity both within and between wafers.

Advantages of ALD Planetary Susceptor

Advantages of ALD Planetary Susceptor

Thermal stability represents another critical function of the planetary wafer carrier. ALD processes require operation within narrow temperature ranges to maintain self-limiting surface reactions and prevent parasitic CVD-like growth. The wafer susceptor provides stable, uniform thermal transfer to the wafer, minimizing local temperature variations that could affect film density, composition, and electrical properties. This capability is particularly critical for temperature-sensitive processes like low-temperature ALD and plasma-enhanced ALD (PEALD).

From a manufacturing perspective, the ALD Planetary Susceptor is a key enabler for scalable and reliable ALD production. By enhancing batch consistency, reducing film non-uniformity, and supporting stable temperature control, it helps fabs achieve higher yields, tighter process margins, and lower total cost of ownership. At Semixlab, the ALD Planetary Susceptor embodies our deep understanding of ALD process physics, equipment integration, and the demands of large-scale film deposition. It delivers a reliable solution for next-generation thin-film deposition technology. We sincerely look forward to becoming your long-term partner in China.

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