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The Rise of Silicon carbide SiC Coated Graphite Susceptors in Advanced Epitaxy

2026-04-29

Silicon carbide coated graphite susceptors are high-end semiconductor consumables and core components formed by depositing a high-purity SiC coating onto a high-purity graphite matrix using processes such as chemical vapor deposition (CVD). In the industry, they are commonly referred to as SiC-coated graphite trays, SiC-coated graphite support plates, or SiC-coated graphite susceptors. Their core function is not merely to support wafers,but to simultaneously fulfill multiple critical roles, including thermal field homogenization, chemical stability within the reaction chamber, prevention of particulate contamination, resistance to oxidation and corrosion, extended service life, and ensuring epitaxial yield. They are widely used in MOCVD, silicon epitaxy, SiC epitaxy, and certain high-temperature heat treatment applications. As semiconductor manufacturing demands for purity, thermal uniformity, service life, and consistency continue to rise, SiC-coated graphite susceptors have evolved from traditional auxiliary components into critical material-based components that influence equipment uptime, film uniformity, and final yield.

Silicon carbide SiC Coated Graphite Susceptor

According to the QYResearch industry report, Global and China Silicon Carbide-Coated Graphite susceptor Market Status and Development Research 20262032, the global market size for silicon carbide-coated graphite susceptors was approximately $338 million in 2025 and is projected to grow to $611 million by 2032, representing a compound annual growth rate (CAGR) of approximately 9.1% from 2026 to 2032. The industry currently remains in a phase of rapid growth, with core growth drivers stemming from the expansion of third-generation semiconductor productionparticularly SiC epitaxyupgrades in silicon epitaxy processes, sustained demand for MOCVD equipment, and the advancement of domestic substitution for semiconductor equipment components. Concurrently, the industry has transitioned from a previously single-focused structure centered on LED/MOCVD to a multi-scenario demand landscape where MOCVD + silicon epitaxy + SiC epitaxyprogress in parallel; From a medium- to long-term perspective, with the advancement of the 8-inch SiC supply chain, the expansion of power device production, and the acceleration of domestic validation for high-temperature, corrosion-resistant components, the industry retains the foundation for medium-to-high-speed expansion. However, the overall price level is expected to stabilize with a slight downward trend, while the value of high-end customized and long-lifespan products will become increasingly prominent.

In terms of product form, the Pancake Susceptor remains the most mainstream segment, accounting for over 70% of the market value in 2025 and maintaining this dominant position through 2032, indicating its solid platform status in MOCVD and multi-wafer epitaxy applications. Barrel Susceptors are primarily designed for rotary, high-throughput batch epitaxial environments. While they have higher technical barriers, their overall growth rate remains relatively moderate. Meanwhile, the Othercategory includes single-wafer, planetary, and highly customized structures. Although this segment has a smaller market base, its growth potential is significant, reflecting rising demand for specialized epitaxial equipment, differentiated reactors, and customer-specific customization. Overall, the evolution of the industrys product structure is not simply a matter of one type replacing another, but rather a composite landscape dominated by standardized pancake-type products, with steady development of barrel-type products and accelerated penetration of non-standard and customized products.

In terms of application structure, MOCVD remains the largest downstream application segment, accounting for nearly 60% of the market value in 2025. However, its share is showing a gradual downward trend, indicating that the industrys growth focus is shifting from traditional LED/GaN epitaxial applications to broader epitaxial systems. Silicon epitaxial susceptors are the second-largest application segment, currently accounting for over 20% of the market, and are expected to maintain rapid growth in the coming years; while susceptors for SiC epitaxy, although currently smaller in absolute scale than those for MOCVD and silicon epitaxy, exhibit the most remarkable growth rate. Their market share is expected to continue rising significantly around 2032, making them the industrys most promising high-growth segment. In other words, MOCVD defines the industrys foundation, silicon epitaxy ensures its stability, and SiC epitaxy determines its growth potential and valuation prospects.

The global market for silicon carbide-coated graphite susceptors currently remains characterized by a competitive landscape where leading overseas players dominate, while Chinese manufacturers are rapidly catching up.The top tier of overseas companies primarily includes Schunk Xycarb Technology, SGL Carbon, CoorsTek, Toyo Tanso, Bay Carbon, Tokai Carbon, and Mersen, among others. Among these, Schunk Xycarb Technology and SGL Carbon continue to wield significant influence in the global high-end market; Among domestic Chinese companies, firms such as Zhejiang Liufang Semiconductor Technology Co., Ltd., Shenzhen Zhicheng Semiconductor Materials Co., Ltd., and Hunan Dezhi New Materials Co., Ltd. have experienced rapid growth in recent years, demonstrating particular strength in the fields of SiC epitaxial equipment components, MOCVD components, and related coating services. Based on 2025 revenue figures, the industrys CR5 has approached 70%, indicating that market concentration remains high but is not entirely set in stone. Improvements by Chinese companies in production volume, customer validation, and local supply chain efficiency have enabled them to gain market share in the mid-to-high-end segments at a significantly faster rate than traditional overseas manufacturers. Future competition will increasingly focus on coating consistency, lifespan stability, cleanliness control, equipment compatibility, and mass delivery capabilities.

Silicon Carbide Coating several unique advantages

On the supply side, global production remains concentrated primarily in North America, China, Europe, and Japan. However, China has been the fastest-growing production region in recent years, with the production sector maintaining double-digit growth from 2025 to 2032. By 2032, China is expected to rank alongside North America or even become a more significant manufacturing hub. North America and Europe continue to dominate high-end products and established customer bases, while Japan maintains a stable presence in certain specialized materials and high-purity graphite systems. From the demand side, the Asia-Pacific region is the absolute core consumption area. By 2025, its share of consumption will exceed 70%, and it will continue to expand at a rate close to double digits in the coming yearssignificantly higher than in regions such as Europe, Latin America, and the Middle East and North Africa. This growth is not driven by a single country but rather by the collective strength of major sales markets formed by clusters in the epitaxial and power semiconductor supply chains, including China, Japan, South Korea, and Taiwan, China. Overall, the global landscape is expected to evolve into a regional pattern characterized by Asia-Pacific as the primary demand driver, Chinas strong catch-up, and Europe and the U.S. maintaining their high-end positions.

The growth logic for the silicon carbide SiC coated graphite susceptor industry is now relatively clear: on the demand side, it is driven by the expansion of SiC epitaxial production, the upgrade of silicon epitaxial processes, and the replacement of existing MOCVD equipment; on the supply side, it is propelled by domestic substitution, policy support, and the strengthening of localized service capabilities; However, this is not a low-barrier, high-volume market. Core barriers to entry center on the quality of high-purity susceptors, the uniformity of SiC coatings, crack and delamination resistance, consistency in service life, cleanliness control, and customer validation cycles. Particularly against a backdrop of generally stable or slightly declining prices, companies that fail to achieve continuous breakthroughs in performance stability and delivery capabilities will struggle to maintain a long-term share of the high-end market by relying solely on cost advantages.

In the coming years, the silicon carbide-coated graphite susceptor industry is likely to maintain medium-to-high growth, with better growth quality than many traditional semiconductor consumables sectors. The fundamental reasons are: First, industry demand is expanding from single-use MOCVD applications to multiple scenarios such as silicon epitaxy and SiC epitaxy; second, Chinese manufacturers are transitioning from merely being able to produceto mass production, continuous validation, and replacing high-end products; Third, customersgrowing demand for products with long service life, low particle content, and high consistency means that industry competition is no longer solely about price, but increasingly depends on the comprehensive capabilities of materials, processes, and delivery systems. It is projected that by around 2032, the global market size will expand further, with the Asia-Pacific region remaining the primary sales market and China poised to become one of the worlds most important centers for incremental supply. From an investment and industrial perspective, the key areas of focus in this industry are not merely capacity expansion, but rather high-end coating capabilities, non-standard customization capabilities, long-life validation capabilities, and the depth of integration with downstream equipment and epitaxy customers.

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