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Popular News
Capacity Breakthrough: New 80,000 m² Production Base Topped Out to Supercharge Semixlab's Advanced Coating Manufacturing Capabilities
2026-06-01
Semixlab Global News — We are thrilled to share a major update from our manufacturing frontline. On November 27, 2025, the main structural framework of our core production and R&D base—Zhejiang Liufang Semiconductor Technology—was officially topped out. This marks a definitive capacity breakthrough for Semixlab as a premium global provider of advanced semiconductor materials.
The project team has demonstrated what industry insiders call "Liufang Acceleration", seamlessly transitioning the project from structural phase to final equipment readiness. The facility is explicitly tailored to house next-generation CVD high-temperature furnaces, ultra-high vacuum purification furnaces, and a comprehensive suite of precision CNC machining centers.
Deep Layout of Pan-Semiconductor Critical Materials
With this new infrastructure, Semixlab is scaling up its full-chain manufacturing capabilities—spanning raw material sourcing (premium imported isostatic graphite), precision machining, ultra-purification (achieving ash levels < 5ppm via GDMS testing), and high-performance CVD deposition.
The new base will significantly expand production capacity for the following strategic semiconductor product lines:
| Product Category | Core Technical Specifications & Capabilities | Primary Semiconductor Applications |
| CVD SiC Coated Products | • Purity: >99.99995% • Structure: 100% FCC β-phase, (111) oriented • Thickness Uniformity Control: Within 10 μm | • Silicon Epitaxy • LED/GaN MOCVD Epitaxy • SiC Epitaxy Halfmoon Parts |
| TaC Coating Products | • Temperature Resistance: Up to 2600°C • High resistance to aggressive gases (H2, NH3, SiH4) • Ultra-high coating bonding force | • Third-generation semiconductor (SiC/GaN) crystal growth • High-temperature induction heating thermal fields |
| Pyrolytic Carbon (PyC) Coating | • Dense & non-porous surface sealing • Total impurity content < 20ppm • High vacuum integrity up to 1800°C | • Graphite heater modification • CZ/PV Mono-crystalline single crystal growth parts |
| High Purity Ceramics & Composites | • Recrystallized SiC (R-SiC) purity >99.96% • Carbon-Carbon (C/C) composites with ash ≤ 20-65 ppm | • Diffusion, oxidation, and annealing furnace tubes & cantilever paddles • High-load RTP/EPI rings |
Semixlab's Scaled-up Manufacturing Capabilities and Advanced CVD Lines
A Commitment to Global Quality Standards
Semixlab-lab-testing-equipment
Supported by a world-class technology team originating from top-tier institutions like Zhejiang University and the Chinese Academy of Sciences, Semixlab’s manufacturing ecosystem operates strictly under ISO 9001, ISO 14001, and ISO 45001 certifications.
As He Shaolong, CEO & Professor, stated during the ceremony, this new facility is a vital response to the global semiconductor industry's demand for stable, high-purity, and high-performance material components. The acceleration of this base ensures that Semixlab remains your most agile, reliable, and technologically advanced partner in the pan-semiconductor supply chain.
For custom mapping, GDMS technical data sheets, or trial component testing kits, please contact our international sales division directly at Semixlab.
